https://doi.org/10.1351/goldbook.09523
Transparent substrate pre-patterned with the desired image that is inserted into the incident beam in photo- and X-ray lithography.
Notes:
- A dark field mask is used with a positive tone photoresist and a bright field mask with a negative tone photoresist.
- Masks are typically transparent fused silica blanks with a pattern defined in a chrome film using direct-write lithography.