Transparent substrate pre-patterned with the desired
image that is inserted into the incident beam in photo- and
X-ray lithography.
Notes: - A dark field mask is used with a positive tone photoresist and a bright field mask with a negative tone photoresist.
- Masks are typically transparent fused silica blanks with a pattern defined in a chrome film using direct-write lithography.
Source:
PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1879 (https://doi.org/10.1515/pac-2018-1215)