09523 IUPAC Gold Book - mask 10.1351/goldbook.09523 09523 current synonym: photomask 1 Transparent substrate pre-patterned with the desired image that is inserted into the incident beam in photo- and X-ray lithography. A dark field mask is used with a positive tone photoresist and a bright field mask with a negative tone photoresist. Masks are typically transparent fused silica blanks with a pattern defined in a chrome film using direct-write lithography. X-ray lithography https://goldbook.iupac.org//terms/view/09520 direct-write lithography https://goldbook.iupac.org//terms/view/09504 image https://goldbook.iupac.org//terms/view/09495 PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1879 (https://doi.org/10.1515/pac-2018-1215) https://goldbook.iupac.org/terms/view/09523/html https://goldbook.iupac.org/terms/view/09523/json https://goldbook.iupac.org/terms/view/09523/plain Citation: 'mask' in IUPAC Compendium of Chemical Terminology, 5th ed. International Union of Pure and Applied Chemistry; 2025. Online version 5.0.0, 2025. 10.1351/goldbook.09523 The IUPAC Gold Book is licensed under Creative Commons Attribution-ShareAlike CC BY-SA 4.0 International (https://creativecommons.org/licenses/by-sa/4.0/) for individual terms. If you are interested in licensing the Gold Book for commercial use, please contact the IUPAC Executive Director at executivedirector@iupac.org . The International Union of Pure and Applied Chemistry (IUPAC) is continuously reviewing and, where needed, updating terms in the Compendium of Chemical Terminology (the IUPAC Gold Book). Users of these terms are encouraged to include the version of a term with its use and to check regularly for updates to term definitions that you are using. 2026-05-31T06:35:08+00:00