mask error enhancement factor

acronym: MEEF
https://doi.org/10.1351/goldbook.09525
Increase in error of pattern edge location during pattern formation when the wavelength of light used to expose a resist is greater than the feature size.
Source:
PAC, 2020, 92, 1861. (Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)) on page 1879 [Terms] [Paper]
Citation: 'mask error enhancement factor' in IUPAC Compendium of Chemical Terminology, 5th ed. International Union of Pure and Applied Chemistry; 2025. Online version 5.0.0, 2025. https://doi.org/10.1351/goldbook.09525 RIS BibTex EndNote
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