dissolution rate

unit: $\pu{nm s^{-1}}$
https://doi.org/10.1351/goldbook.09474
Rate at which resist is removed during development.
Note: Usually reported in \(\pu{nm s^{-1}}\).
Source:
PAC, 2020, 92, 1861. (Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)) on page 1872 [Terms] [Paper]