dissolution rate

unit: $\pu{nm s^{-1}}$

https://doi.org/10.1351/goldbook.09474

Rate at which resist is removed during development.

Note: Usually reported in $\pu{nm s^{-1}}$.

Source:
PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1872 (https://doi.org/10.1515/pac-2018-1215)