Plot of the fraction of the original thickness that remains after the
development of a uniformly irradiated
resist versus the logarithm of the incident
exposure dose.
Source:
PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1870 (https://doi.org/10.1515/pac-2018-1215)