dose

units: $\pu{mJ cm^{-2}}$, $\pu{\upmu\!C cm^{-2}}$
synonym: exposure dose
https://doi.org/10.1351/goldbook.09477
Amount of radiation per unit area to which a resist is exposed.
Note: For optical lithography, exposure dose is reported in \(\pu{mJ cm^{-2}}\), while for electron beam lithography, exposure dose is reported in \(\pu{\upmu\!C cm^{-2}}\).
Source:
PAC, 2020, 92, 1861. (Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)) on page 1872 [Terms] [Paper]
Citation: 'dose' in IUPAC Compendium of Chemical Terminology, 5th ed. International Union of Pure and Applied Chemistry; 2025. Online version 5.0.0, 2025. https://doi.org/10.1351/goldbook.09477 RIS BibTex EndNote
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