In
secondary-ion mass spectrometry, sputter
depth profiling involving two ion guns.
Notes: - Two similar ion guns can be used in opposite azimuths of the sample to reduce the development of topography.
- In time-of-flight mass spectrometers, one beam is used with a short on-time for the secondary ion mass spectrometry analysis, while a second is used during the period when the first is off and the mass analysis has been completed in each cycle. The second gun provides the ions for sputter removal of the sample to form the depth profile. This combination allows practical sputtering rates to be achieved and the profiling to be optimized separately from the optimization for the SIMS analysis.
Source:
PAC, 2020, 92, 1781. 'Glossary of methods and terms used in surface chemical analysis (IUPAC Recommendations 2020)' on page 1838 (https://doi.org/10.1515/pac-2019-0404)