https://doi.org/10.1351/goldbook.09259
Depth resolution in a sample arising from parameters of the instrument.
Notes:
- This concept is used in the secondary-ion mass spectrometry, Auger electron spectroscopy, and X-ray photoelectron spectroscopy.
- In sputter depth profiling, these parameters involve the system alignment and can include the ion species, energy, and angle of incidence, as well as the option to rotate the sample while sputtering.