dose

units: $\pu{mJ cm^{-2}}$, $\pu{\upmu\!C cm^{-2}}$

synonym: exposure dose

https://doi.org/10.1351/goldbook.09477

Amount of radiation per unit area to which a resist is exposed.

Note: For optical lithography, exposure dose is reported in $\pu{mJ cm^{-2}}$, while for electron beam lithography, exposure dose is reported in $\pu{\upmu\!C cm^{-2}}$.

Source:
PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1872 (https://doi.org/10.1515/pac-2018-1215)