defect-free pattern

https://doi.org/10.1351/goldbook.09465
Imaged resist without imperfections in pattern.
Notes:
  1. In a photoresist, for example, no error is introduced by the photochemistry.
  2. In a DSA resist, for example, no error is introduced by the self-assembly process.
Source:
PAC, 2020, 92, 1861. (Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)) on page 1870 [Terms] [Paper]
Citation: 'defect-free pattern' in IUPAC Compendium of Chemical Terminology, 5th ed. International Union of Pure and Applied Chemistry; 2025. Online version 5.0.0, 2025. https://doi.org/10.1351/goldbook.09465 RIS BibTex EndNote
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