defect-free pattern

https://doi.org/10.1351/goldbook.09465
Imaged resist without imperfections in pattern.
Notes:
  1. In a photoresist, for example, no error is introduced by the photochemistry.
  2. In a DSA resist, for example, no error is introduced by the self-assembly process.
Source:
PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1870 (https://doi.org/10.1515/pac-2018-1215)