Pattern formation using a directed electron beam or ion beam that skips from region to region requiring exposure but is otherwise turned off.
See also: raster scan
Source:
PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1890 (https://doi.org/10.1515/pac-2018-1215)