Sinusoidal variation in the lithographic
clearance dose arising from changes in the phase difference between incoming and outgoing radiation that is induced by variations in
resist thickness.
Source:
PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1889 (https://doi.org/10.1515/pac-2018-1215)