Resist that undergoes solubility change upon exposure of
photoacid generator, followed by thermally activated acid catalyzed
deprotection.
Source:
PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1886 (https://doi.org/10.1515/pac-2018-1215)