reactive ion etching

initialism: RIE
https://doi.org/10.1351/goldbook.09563
Etching technology used in microfabrication that uses chemically reactive plasma to remove material from a substrate.
Source:
PAC, 2020, 92, 1861. (Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)) on page 1886 [Terms] [Paper]
Citation: 'reactive ion etching' in IUPAC Compendium of Chemical Terminology, 5th ed. International Union of Pure and Applied Chemistry; 2025. Online version 5.0.0, 2025. https://doi.org/10.1351/goldbook.09563 RIS BibTex EndNote
Div. IVTextXMLJSON