Process for revealing the latent image in a
resist in which the exposed regions are more soluble in the developer than are the unexposed regions.
See also: positive-tone resist
Source:
PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1884 (https://doi.org/10.1515/pac-2018-1215)