https://doi.org/10.1351/goldbook.09554
Process to deposit a solid film on a substrate resulting from plasma-induced reactions of precursor compounds, either in the gaseous state or on the film surface.
Notes:
- A RF frequency or DC discharge generated by two electrodes inducing a plasma from a gas occupying the space between.
- Examples of PECVD films are \(\ce{SiO2}\) films via PECVD of dichlorosilane or silane and oxygen precursors or tetraethoxysilane in an oxygen or oxygen-argon plasma, silicon nitride formed from silane and ammonia or nitrogen, and amorphous silicon from monosilane or tetrachlorosilane, as well as polymers from vinyl monomers.