pitch division

https://doi.org/10.1351/goldbook.09552

Method for making a lithographic pattern smaller than that deemed possible given the wavelength of the imaging radiation.

Note: A current objective of directed self-assembly is to use the process with conventional lithography to double the pitch.

Source:
PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1884 (https://doi.org/10.1515/pac-2018-1215)