Title: 2-photon lithography
Long Title: IUPAC Gold Book - 2-photon lithography
DOI: 10.1351/goldbook.09522
Status: current

Definition
Photolithography within a thick photoresist film, within which the photochemically-induced solubility change results from the simultaneous absorption of two photons.

Notes
1) Usually the imaging radiation is of near-IR wavelength.
2) An instrument such as a confocal microscope can be used for two-photon lithography.

Related Term
- Photolithography: https://goldbook.iupac.org//terms/view/09517

Source
- PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1878 (https://doi.org/10.1515/pac-2018-1215)

Other Outputs
- html: https://goldbook.iupac.org/terms/view/09522/html
- json: https://goldbook.iupac.org/terms/view/09522/json
- xml: https://goldbook.iupac.org/terms/view/09522/xml

Citation: Citation: '2-photon lithography' in IUPAC Compendium of Chemical Terminology, 5th ed. International Union of Pure and Applied Chemistry; 2025. Online version 5.0.0, 2025. 10.1351/goldbook.09522
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Disclaimer: The International Union of Pure and Applied Chemistry (IUPAC) is continuously reviewing and, where needed, updating terms in the Compendium of Chemical Terminology (the IUPAC Gold Book). Users of these terms are encouraged to include the version of a term with its use and to check regularly for updates to term definitions that you are using.
Accessed: 2026-05-08T12:47:57+00:00