Title: direct-write lithography
Long Title: IUPAC Gold Book - direct-write lithography
DOI: 10.1351/goldbook.09504
Status: current

Definition
Pattern created without recourse to irradiation through a mask of the image.

Note
Typical direct-write imaging systems are electron-beam lithography and ion-beam lithography.

Related Terms
- electron-beam lithography: https://goldbook.iupac.org//terms/view/09505
- image: https://goldbook.iupac.org//terms/view/09495
- mask: https://goldbook.iupac.org//terms/view/09523

Source
- PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1876 (https://doi.org/10.1515/pac-2018-1215)

Other Outputs
- html: https://goldbook.iupac.org/terms/view/09504/html
- json: https://goldbook.iupac.org/terms/view/09504/json
- xml: https://goldbook.iupac.org/terms/view/09504/xml

Citation: Citation: 'direct-write lithography' in IUPAC Compendium of Chemical Terminology, 5th ed. International Union of Pure and Applied Chemistry; 2025. Online version 5.0.0, 2025. 10.1351/goldbook.09504
License: The IUPAC Gold Book is licensed under Creative Commons Attribution-ShareAlike CC BY-SA 4.0 International (https://creativecommons.org/licenses/by-sa/4.0/) for individual terms.
Collection: If you are interested in licensing the Gold Book for commercial use, please contact the IUPAC Executive Director at executivedirector@iupac.org .
Disclaimer: The International Union of Pure and Applied Chemistry (IUPAC) is continuously reviewing and, where needed, updating terms in the Compendium of Chemical Terminology (the IUPAC Gold Book). Users of these terms are encouraged to include the version of a term with its use and to check regularly for updates to term definitions that you are using.
Accessed: 2026-05-31T07:34:19+00:00