Rate of material removal using either a wet or a dry-etch process.
Note: Usually reported in \(\pu{\upmu\!m min^{-1}}\).
Source:
PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1874 (https://doi.org/10.1515/pac-2018-1215)