Title: dry etching
Long Title: IUPAC Gold Book - dry etching
DOI: 10.1351/goldbook.09489
Status: current

Definition
Process of removal of material, typically of a masked pattern on a semiconductor, by exposing it to a bombardment of ions.

Related Term
- masked: https://goldbook.iupac.org//terms/view/09523

Source
- PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1874 (https://doi.org/10.1515/pac-2018-1215)

Other Outputs
- html: https://goldbook.iupac.org/terms/view/09489/html
- json: https://goldbook.iupac.org/terms/view/09489/json
- xml: https://goldbook.iupac.org/terms/view/09489/xml

Citation: Citation: 'dry etching' in IUPAC Compendium of Chemical Terminology, 5th ed. International Union of Pure and Applied Chemistry; 2025. Online version 5.0.0, 2025. 10.1351/goldbook.09489
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Accessed: 2026-05-31T05:49:09+00:00