09482 IUPAC Gold Book - dry-etch resistance 10.1351/goldbook.09482 09482 current synonym: etch resistance 1 Facility of an exposed resist to withstand etching conditions, usually a plasma, determined in comparison to a reference standard. Plasma may be oxygen or halogen-based. resist https://goldbook.iupac.org//terms/view/09564 PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1873 (https://doi.org/10.1515/pac-2018-1215) https://goldbook.iupac.org/terms/view/09482/html https://goldbook.iupac.org/terms/view/09482/json https://goldbook.iupac.org/terms/view/09482/plain Citation: 'dry-etch resistance' in IUPAC Compendium of Chemical Terminology, 5th ed. International Union of Pure and Applied Chemistry; 2025. Online version 5.0.0, 2025. 10.1351/goldbook.09482 The IUPAC Gold Book is licensed under Creative Commons Attribution-ShareAlike CC BY-SA 4.0 International (https://creativecommons.org/licenses/by-sa/4.0/) for individual terms. If you are interested in licensing the Gold Book for commercial use, please contact the IUPAC Executive Director at executivedirector@iupac.org . The International Union of Pure and Applied Chemistry (IUPAC) is continuously reviewing and, where needed, updating terms in the Compendium of Chemical Terminology (the IUPAC Gold Book). Users of these terms are encouraged to include the version of a term with its use and to check regularly for updates to term definitions that you are using. 2026-05-08T12:45:43+00:00