Compound that, when included in a
resist formulation, slows the rate of dissolution.
Notes: - In lithography, the effectiveness of a dissolution inhibitor is changed after exposure to imaging radiation, which facilitates its application in resist formulations.
- A typical example of a resist based on a dissolution inhibitor comprises a diazonaphthoquinone within a phenolic resin.
Source:
PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1871 (https://doi.org/10.1515/pac-2018-1215)