Removal of a protecting group which leads to a change in the solubility of a polymeric
resist.
Note: Deprotection is a common feature in the performance of most chemical amplification
resists.
Source:
PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1870 (https://doi.org/10.1515/pac-2018-1215)