https://doi.org/10.1351/goldbook.09322
Parameter that, when introduced in place of the electron inelastic mean free path into an expression derived for Auger electron spectroscopy and X-ray photoelectron spectroscopy on the assumption that elastic scattering effects are negligible for a given quantitative application, will correct that expression for elastic scattering effects.
Notes:
- The effective attenuation length can have different values for different quantitative applications of AES and XPS. However, the most common use of effective attenuation length is in the determination of overlayer-film thicknesses from the measurement of the changes of overlayer and substrate Auger-electron or photoelectron signal intensities after the deposition of a film or as a function of the emission angle. For emission angles of up to about \(\pu{60\!^{\circ}}\) (with respect to the surface normal), it is often satisfactory to use a single value of this parameter. For greater emission angles, the effective attenuation length can depend on this angle.
- Since there are different uses of this term, it is recommended that users specify clearly the particular application and the definition of the parameter for that application (e.g. by giving a formula or by providing a reference to a particular source).