sputter depth profile

initialism: SDP

https://doi.org/10.1351/goldbook.09285

Compositional depth profile obtained when the surface composition is measured while material is removed by sputtering.

Note: In some analytical methods, such as secondary ion mass spectrometry, the sputtering is often accomplished by the ion beam used for analysis, but in other methods an ion beam might need to be added.

Source:
PAC, 2020, 92, 1781. 'Glossary of methods and terms used in surface chemical analysis (IUPAC Recommendations 2020)' on page 1813 (https://doi.org/10.1515/pac-2019-0404)