Measurement method for surface and interface roughness and density, layer thickness of thin layers, and electron density profile achieved by reflecting X-rays from a flat sample and analysing the reflected intensity as a function of angle.
Note: Monochromatic X-rays of low divergence are required. Many layers can be modelled, with thicknesses between about
\(\pu{1 nm}\) and a few
\(\pu{\upmu\!m}\), and (subject to conditions) fitted to the data. The surface needs to be flat over the
beam footprint of typically
\(\pu{10 mm}\) to
\(\pu{40 mm}\).
See also: specular X-ray reflectometry
Source:
PAC, 2020, 92, 1781. 'Glossary of methods and terms used in surface chemical analysis (IUPAC Recommendations 2020)' on page 1795 (https://doi.org/10.1515/pac-2019-0404)