Measurement method in which a focused beam of primary ions produces secondary ions by sputtering from a solid surface. The secondary ions are analysed by mass spectrometry.
Note: SIMS is, by convention, generally classified as either dynamic, in which the material surface layers are continually removed as they are being measured, or static, in which the ion areic dose during measurement is restricted to less than \(\pu{E16}\) ions \(\pu{m2}\) in order to retain the surface in an essentially undamaged state.
See also: dynamic secondary-ion mass spectrometry, static secondary-ion mass spectrometry
Source:
PAC, 2020, 92, 1781. 'Glossary of methods and terms used in surface chemical analysis (IUPAC Recommendations 2020)' on page 1789 (https://doi.org/10.1515/pac-2019-0404)